JIS K 0105:2012 - $107.00   BUY NOW

Methods for determination of fluorine compounds in flue gas

JIS K 0105:2012 Publication Description:

--- Abstract Source: JIS K 0105:2012 ---

ISO 105-A01:2010 provides general information about the methods for testing colour fastness of textiles for the guidance of users. The uses and limitations of the methods are pointed out, several terms are defined, an outline of the form of the methods is given and the contents of the clauses constituting the methods are discussed. Procedures common to a number of the methods are discussed briefly.

International Classification for Standards (ICS)

ICS Classification Field ICS Field Sub-Group and Number
ICS-13-Environment ICS Stationary Source Emissions (13.040.40)
ICS-71-Chemical ICS Chemical Analysis (71.040.40)

ICS Related Standards

Cart Document Number Document Title
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$138.00 ISO 10396:2007 Stationary source emissions - Sampling for the automated determination of gas emission concentrations for permanently-installed monitoring systems
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$138.00 ISO 10780:1994 Stationary source emissions - Measurement of velocity and volume flowrate of gas streams in ducts
$138.00 ISO 10849:1996 Stationary source emissions - Determination of the mass concentration of nitrogen oxides - Performance characteristics of automated measuring systems
$162.00 ISO 11042-1:1996 Gas turbines - Exhaust gas emission - Part 1: Measurement and evaluation
$103.00 ISO 11042-2:1996 Gas turbines - Exhaust gas emission - Part 2: Automated emission monitoring
$162.00 ISO 11057:2011 Air quality - Test method for filtration characterization of cleanable filter media
$138.00 ISO 11338-1:2003 Stationary source emissions - Determination of gas and particle-phase polycyclic aromatic hydrocarbons - Part 1: Sampling
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$103.00 ISO 11564:1998 Stationary source emissions - Determination of the mass concentration of nitrogen oxides - Naphthylethylenediamine photometric method
$103.00 ISO 11632:1998 Stationary source emissions - Determination of mass concentration of sulfur dioxide - Ion chromatography method
$103.00 ISO 12039:2001 Stationary source emissions -- Determination of carbon monoxide, carbon dioxide and oxygen -- Performance characteristics and calibration of automated measuring systems
$185.00 ISO 12141:2002 Stationary source emissions - Determination of mass concentration of particulate matter (dust) at low concentrations - Manual gravimetric method
$162.00 ISO 13199:2012 Stationary source emissions - Determination of total volatile organic compounds (TVOCs) in waste gases from non-combustion processes - Non-dispersive infrared analyser equipped with catalytic converter
$185.00 ISO 13271:2012 Stationary source emissions - Determination of PM10/PM2,5 mass concentration in flue gas - Measurement at higher concentrations by use of virtual impactors
$185.00 ISO 13833:2013 Stationary source emissions - Determination of the ratio of biomass (biogenic) and fossil-derived carbon dioxide - Radiocarbon sampling and determination
$103.00 ISO 14164:1999 Stationary source emissions -- Determination of the volume flowrate of gas streams in ducts -- Automated method
$162.00 ISO 14385-1:2014 Stationary source emissions - Greenhouse gases - Part 1: Calibration of automated measuring systems
$162.00 ISO 14385-2:2014 Stationary source emissions - Greenhouse gases - Part 2: Ongoing quality control of automated measuring systems
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$232.00 ISO 16911-1:2013 Stationary source emissions - Manual and automatic determination of velocity and volume flow rate in ducts - Part 1: Manual reference method
$209.00 ISO 16911-2:2013 Stationary source emissions - Manual and automatic determination of velocity and volume flow rate in ducts - Part 2: Automated measuring systems
$185.00 ISO 17179:2016 Stationary source emissions - Determination of the mass concentration of ammonia in flue gas - Performance characteristics of automated measuring systems
$138.00 ISO 17211:2015 Stationary source emissions - Sampling and determination of selenium compounds in flue gas
$138.00 ISO 18466:2016 Stationary source emissions - Determination of the biogenic fraction in CO2 in stack gas using the balance method
$162.00 ISO 21258:2010 Stationary source emissions - Determination of the mass concentration of dinitrogen monoxide (N2O) - Reference method: Non-dispersive infrared method
$185.00 ISO 23210:2009 Stationary source emissions - Determination of PM10/PM2,5 mass concentration in flue gas - Measurement at low concentrations by use of impactors
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$162.00 ISO 25140:2010 Stationary source emissions - Automatic method for the determination of the methane concentration using flame ionisation detection (FID)
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$19.00 ISO 7934/AMD1:1998 Amendment 1 to ISO 7934:1989
$68.00 ISO 7935:1992 Stationary source emissions - Determination of the mass concentration of sulfur dioxide - Performance characteristics of automated measuring methods
$185.00 ISO 9096:2003 Stationary source emissions - Manual determination of mass concentration of particulate matter
$107.00 JIS A 1901:2015 Determination of the emission of volatile organic compounds and aldehydes by building products -- Small chamber method
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$107.00 JIS B 7982:2002 Automated measuring systems and analyzers for nitrogen oxides in flue gas
$87.00 JIS K 0081:2012 Method for determination of boron in flue gas
$58.00 JIS K 0086:1998 Methods for determination of phenols in flue gas
$49.00 JIS K 0088:1997 Methods for determination of benzene in flue gas
$39.00 JIS K 0089:1998 Methods for determination of acrolein in flue gas
$49.00 JIS K 0090:1998 Method for determination of phosgene in flue gas
$39.00 JIS K 0091:1998 Methods for determination of carbon disulfide in flue gas
$49.00 JIS K 0092:1998 Methods for determination of mercaptan in flue gas
$107.00 JIS K 0095:1999 Methods for sampling of flue gas
$26.00 JIS K 0098:1998 Methods for determination of carbon monoxide in flue gas
$68.00 JIS K 0099:2004 Methods for determination of ammonia in flue gas
$107.00 JIS K 0103:2011 Methods for determination of sulfur oxides in flue gas
$107.00 JIS K 0104:2011 Methods for determination of nitrogen oxides in flue gas
$49.00 JIS K 0222:1997 Methods for determination of mercury in stack gas
$97.00 JIS K 0301:2016 Methods for determination of oxygen in flue gas
$42.00 JIS K 0301:1998 Methods for determination of oxygen in flue gas
$39.00 JIS K 0305:1997 Methods for determination of trichloroethylene and tetrachloroethylene in flue gas
$136.00 JIS K 0311:2005 Method for determination of tetra-through octachlorodibenzo-p-dioxins, tetra-through octachlorodibenzofurans and dioxin-like polychlorinatedbiphenyls in stationary source emissions
$68.00 JIS K 0098:2016 Methods for determination of carbon monoxide in flue gas
$185.00 ISO 9096:2017 Stationary source emissions - Manual determination of mass concentration of particulate matter
$162.00 ISO 10810:2010 Surface chemical analysis - X-ray photoelectron spectroscopy - Guidelines for analysis
$138.00 ISO 11039:2012 Surface chemical analysis - Scanning-probe microscopy - Measurement of drift rate
$162.00 ISO 11505:2012 Surface chemical analysis - General procedures for quantitative compositional depth profiling by glow discharge optical emission spectrometry
$138.00 ISO 11775:2015 Surface chemical analysis - Scanning-probe microscopy - Determination of cantilever normal spring constants
$209.00 ISO 11952:2014 Surface chemical analysis - Scanning-probe microscopy - Determination of geometric quantities using SPM: Calibration of measuring systems
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$103.00 ISO 13083:2015 Surface chemical analysis - Scanning probe microscopy - Standards on the definition and calibration of spatial resolution of electrical scanning probe microscopes (ESPMs) such as SSRM and SCM for 2D-dopant imaging and other purposes
$68.00 ISO 13084:2011 Surface chemical analysis - Secondary-ion mass spectrometry - Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
$138.00 ISO 13095:2014 Surface Chemical Analysis - Atomic force microscopy - Procedure for in situ characterization of AFM probe shank profile used for nanostructure measurement
$185.00 ISO 13424:2013 Surface chemical analysis - X-ray photoelectron spectroscopy - Reporting of results of thin-film analysis
$138.00 ISO/TS 14167:2003 Gas analysis - General quality assurance aspects in the use of calibration gas mixtures - Guidelines
$185.00 ISO/TR 14187:2011 Surface chemical analysis - Characterization of nanostructured materials
$138.00 ISO 14237:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
$103.00 ISO 14606:2015 Surface chemical analysis - Sputter depth profiling - Optimization using layered systems as reference materials
$123.00 ISO 14606:2000 Surface chemical analysis -- Sputter depth profiling -- Optimization using layered systems as reference materials
$103.00 ISO 14701:2011 Surface chemical analysis - X-ray photoelectron spectroscopy - Measurement of silicon oxide thickness
$138.00 ISO 14706:2014 Surface chemical analysis - Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
$139.00 ISO 14706:2000 Surface chemical analysis -- Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
$68.00 ISO 14707:2015 Surface chemical analysis - Glow discharge optical emission spectrometry (GD-OES) - Introduction to use
$88.00 ISO 14707:2000 Surface chemical analysis -- Glow discharge optical emission spectrometry (GD-OES) -- Introduction to use
$209.00 ISO 14912:2003 Gas analysis - Conversion of gas mixture composition data
$103.00 ISO 14975:2000 Surface chemical analysis -- Information formats
$185.00 ISO 14976:1998 Surface chemical analysis -- Data transfer format
$138.00 ISO/TS 15338:2009 Surface chemical analysis - Glow discharge mass spectrometry (GD-MS) - Introduction to use
$45.00 ISO 15470:2004 Surface chemical analysis - X-ray photoelectron spectroscopy - Description of selected instrumental performance parameters
$45.00 ISO 15471:2016 Surface chemical analysis - Auger electron spectroscopy - Description of selected instrumental performance parameters
$51.00 ISO 15471:2004 Surface chemical analysis - Auger electron spectroscopy - Description of selected instrumental performance parameters
$162.00 ISO 15472:2010 Surface chemical analysis - X-ray photoelectron spectrometers - Calibration of energy scales
$162.00 ISO 15796:2005 Gas analysis - Investigation and treatment of analytical bias
$68.00 ISO/TR 15969:2001 Surface chemical analysis - Depth profiling - Measurement of sputtered depth
$103.00 ISO 16129:2012 Surface chemical analysis - X-ray photoelectron spectroscopy - Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer
$68.00 ISO 16242:2011 Surface chemical analysis - Recording and reporting data in Auger electron spectroscopy (AES)
$68.00 ISO 16243:2011 Surface chemical analysis - Recording and reporting data in X-ray photoelectron spectroscopy (XPS)
$138.00 ISO/TR 16268:2009 Surface chemical analysis - Proposed procedure for certifying the retained areic dose in a working reference material produced by ion implantation
$162.00 ISO 16413:2013 Evaluation of thickness, density and interface width of thin films by X-ray reflectometry - Instrumental requirements, alignment and positioning, data collection, data analysis and reporting
$103.00 ISO 16531:2013 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
$103.00 ISO 16664:2004 Gas analysis - Handling of calibration gases and gas mixtures - Guidelines
$185.00 ISO 16962:2017 Surface chemical analysis - Analysis of zinc- and/or aluminium-based metallic coatings by glow-discharge optical-emission spectrometry
$162.00 ISO 16962:2005 Surface chemical analysis - Analysis of zinc- and/or aluminium-based metallic coatings by glow-discharge optical-emission spectrometry
$103.00 ISO 17109:2015 Surface chemical analysis - Depth profiling - Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
$103.00 ISO 17331:2004 Surface chemical analysis - Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
$19.00 ISO 17331/Amd1:2010 Amendment 1 to ISO 17331
$68.00 ISO 17560:2014 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon
$88.00 ISO 17560:2002 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon
$138.00 ISO 17862:2013 Surface chemical analysis - Secondary ion mass spectrometry - Linearity of intensity scale in single ion counting time-of-flight mass analysers
$68.00 ISO 17973:2016 Surface chemical analysis - Medium-resolution Auger electron spectrometers - Calibration of energy scales for elemental analysis
$88.00 ISO 17973:2002 Surface chemical analysis - Medium-resolution Auger electron spectrometers - Calibration of energy scales for elemental analysis
$162.00 ISO 17974:2002 Surface chemical analysis - High-resolution Auger electron spectrometers - Calibration of energy scales for elemental and chemical-state analysis
$45.00 ISO 18114:2003 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
$232.00 ISO 18115-1:2013 Surface chemical analysis - Vocabulary - Part 1: General terms and terms used in spectroscopy
$185.00 ISO 18115-2:2013 Surface chemical analysis - Vocabulary - Part 2: Terms used in scanning-probe microscopy
$103.00 ISO 18116:2005 Surface chemical analysis - Guidelines for preparation and mounting of specimens for analysis
$68.00 ISO 18117:2009 Surface chemical analysis - Handling of specimens prior to analysis
$138.00 ISO 18118:2015 Surface chemical analysis - Auger electron spectroscopy and X-ray photoelectron spectroscopy - Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
$149.00 ISO 18118:2004 Surface chemical analysis - Auger electron spectroscopy and X-ray photoelectron spectroscopy - Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
$68.00 ISO 18337:2015 Surface chemical analysis - Surface characterization - Measurement of the lateral resolution of a confocal fluorescence microscope
$68.00 ISO/TR 18392:2005 Surface chemical analysis - X-ray photoelectron spectroscopy - Procedures for determining backgrounds
$138.00 ISO/TR 18394:2016 Surface chemical analysis - Auger electron spectroscopy - Derivation of chemical information
$123.00 ISO/TR 18394:2006 Surface chemical analysis - Auger electron spectroscopy - Derivation of chemical information
$162.00 ISO/TS 18507:2015 Surface chemical analysis - Use of Total Reflection X-ray Fluorescence spectroscopy in biological and environmental analysis
$138.00 ISO 18516:2006 Surface chemical analysis - Auger electron spectroscopy and X-ray photoelectron spectroscopy - Determination of lateral resolution
$103.00 ISO 18554:2016 Surface chemical analysis - Electron spectroscopies - Procedures for identifying, estimating and correcting for unintended degradation by X-rays in a material undergoing analysis by X-ray photoelectron spectroscopy
$68.00 ISO 19229:2015 Gas analysis - Purity analysis and the treatment of purity data
$68.00 ISO 19318:2004 Surface chemical analysis - X-ray photoelectron spectroscopy - Reporting of methods used for charge control and charge correction
$232.00 ISO/TR 19319:2013 Surface chemical analysis - Fundamental approaches to determination of lateral resolution and sharpness in beam-based methods
$138.00 ISO 19830:2015 Surface chemical analysis - Electron spectroscopies - Minimum reporting requirements for peak fitting in X-ray photoelectron spectroscopy
$45.00 ISO 20341:2003 Surface chemical analysis - Secondary-ion mass spectrometry - Method for estimating depth resolution parameters with multiple delta-layer reference materials
$103.00 ISO 20903:2011 Surface chemical analysis - Auger electron spectroscopy and X-ray photoelectron spectroscopy - Methods used to determine peak intensities and information required when reporting results
$103.00 ISO 21079-1:2008 Chemical analysis of refractories containing alumina, zirconia and silica - Refractories containing 5 percent to 45 percent of ZrO2 (alternative to the X-ray fluorescence method) - Part 1: Apparatus, reagents and dissolution
$103.00 ISO 21079-2:2008 Chemical analysis of refractories containing alumina, zirconia, and silica - Refractories containing 5 percent to 45 percent of ZrO2 (alternative to the X-ray fluorescence method) - Part 2: Wet chemical analysis
$103.00 ISO 21079-3:2008 Chemical analysis of refractories containing alumina, zirconia, and silica - Refractories containing 5 percent to 45 percent of ZrO2 (alternative to the X-ray fluorescence method) - Part 3: Flame atomic absorption spectrophotometry (FAAS (TITLE TRUNCATED)
$103.00 ISO 21270:2004 Surface chemical analysis - X-ray photoelectron and Auger electron spectrometers - Linearity of intensity scale
$68.00 ISO 22048:2004 Surface chemical analysis - Information format for static secondary-ion mass spectrometry
$103.00 ISO/TR 22335:2007 Surface chemical analysis - Depth profiling - Measurement of sputtering rate: mesh-replica method using a mechanical stylus profilometer
$138.00 ISO 23812:2009 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth calibration for silicon using multiple delta-layer reference materials
$68.00 ISO 23830:2008 Surface chemical analysis - Secondary-ion mass spectrometry - Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
$103.00 ISO 24236:2005 Surface chemical analysis - Auger electron spectroscopy - Repeatability and constancy of intensity scale
$68.00 ISO 24237:2005 Surface chemical analysis - X-ray photoelectron spectroscopy - Repeatability and constancy of intensity scale
$185.00 ISO/TS 25138:2010 Surface chemical analysis - Analysis of metal oxide films by glow-discharge optical-emission spectrometry
$51.00 ISO 2590:1973 General method for the determination of arsenic -- Silver diethyldithiocarbamate photometric method
$88.00 ISO 2718:1974 Standard layout for a method of chemical analysis by gas chromatography
$103.00 ISO 27911:2011 Surface chemical analysis - Scanning-probe microscopy - Definition and calibration of the lateral resolution of a near-field optical microscope
$162.00 ISO 28600:2011 Surface chemical analysis - Data transfer format for scanning-probe microscopy
$103.00 ISO/TS 29041:2008 Gas mixtures - Gravimetric preparation - Mastering correlations in composition
$138.00 ISO 29081:2010 Surface chemical analysis - Auger electron spectroscopy - Reporting of methods used for charge control and charge correction
$45.00 ISO 3165:1976 Sampling of chemical products for industrial use -- Safety in sampling
$88.00 ISO 5790:1979 Inorganic chemical products for industrial use -- General method for determination of chloride content -- Mercurimetric method
$68.00 ISO 6141:2015 Gas analysis - Contents of certificates for calibration gas mixtures
$88.00 ISO 6141:2000 Gas analysis -- Requirements for certificates for calibration gases and gas mixtures
$200.00 ISO 6142:2001 Gas analysis -- Preparation of calibration gas mixtures -- Gravimetric method
$185.00 ISO 6142-1:2015 Gas analysis - Preparation of calibration gas mixtures - Part 1: Gravimetric method for Class I mixtures
$22.00 ISO 6142/Amd1:2009 Gas analysis - Preparation of calibration gas mixtures - Weighing methods - Amendment 1: Liquid introduction
$162.00 ISO 6143:2001 Gas analysis -- Comparison methods for determining and checking the composition of calibration gas mixtures
$162.00 ISO 6144:2003 Gas analysis - Preparation of calibration gas mixtures - Static volumetric method
$162.00 ISO 6145-1:2003 Gas analysis - Preparation of calibration gas mixtures using dynamic volumetric methods - Part 1: Methods of calibration
$103.00 ISO 6145-10:2002 Gas analysis - Preparation of calibration gas mixtures using dynamic volumetric methods - Part 10: Permeation method
$103.00 ISO 6145-11:2005 Gas analysis - Preparation of calibration gas mixtures using dynamic volumetric methods - Part 11: Electrochemical generation
$162.00 ISO 6145-2:2014 Gas analysis - Preparation of calibration gas mixtures using dynamic methods - Part 2: Piston pumps
$77.00 ISO 6145-2:2001 Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 2: Volumetric pumps
$103.00 ISO 6145-4:2004 Gas analysis - Preparation of calibration gas mixtures using dynamic volumetric methods - Part 4: Continuous syringe injection method
$103.00 ISO 6145-5:2009 Gas analysis - Preparation of calibration gas mixtures using dynamic volumetric methods - Part 5: Capillary calibration devices
$68.00 ISO 6145-6:2003 Gas analysis - Preparation of calibration gas mixtures using dynamic volumetric methods - Part 6: Critical orifices
$103.00 ISO 6145-7:2009 Gas analysis - Preparation of calibration gas mixtures using dynamic volumetric methods - Part 7: Thermal mass-flow controllers
$138.00 ISO 6145-8:2005 Gas analysis - Preparation of calibration gas mixtures using dynamic volumetric methods - Part 8: Diffusion method
$103.00 ISO 6145-9:2009 Gas analysis - Preparation of calibration gas mixtures using dynamic volumetric methods - Part 9: Saturation method
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$68.00 ISO 6228:1980 Chemical products for industrial use -- General method for determination of traces of sulphur compounds, as sulphate, by reduction and titrimetry
$51.00 ISO 6382:1981 General method for determination of silicon content -- Reduced molybdosilicate spectrophotometric method
$51.00 ISO 6685:1982 Chemical products for industrial use -- General method for determination of iron content -- 1,10-Phenanthroline spectrophotometric method
$103.00 ISO 7504:2015 Gas analysis - Vocabulary
$173.00 ISO 7504:2001 Gas analysis - Vocabulary
$45.00 ISO 758:1976 Liquid chemical products for industrial use -- Determination of density at 20 degrees C
$45.00 ISO 759:1981 Volatile organic liquids for industrial use -- Determination of dry residue after evaporation on water bath -- General method
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$138.00 ISO 78-2:1999 Chemistry -- Layouts for standards -- Part 2: Methods of chemical analysis
$162.00 ISO 8213:1986 Chemical products for industrial use -- Sampling techniques -- Solid chemical products in the form of particles varying from powders to coarse lumps
$68.00 ISO 918:1983 Volatile organic liquids for industrial use -- Determination of distillation characteristics
$107.00 JIS A 1901:2015 Determination of the emission of volatile organic compounds and aldehydes by building products -- Small chamber method
$90.00 JIS A 1901:2009 Determination of the emission of volatile organic compounds and aldehydes for building products -- Small chamber method
$49.00 JIS B 7951:2004 Continuous analyzer for carbon monoxide in ambient air
$107.00 JIS B 7982:2002 Automated measuring systems and analyzers for nitrogen oxides in flue gas
$68.00 JIS K 0068:2001 Test methods for water content of chemical products
$87.00 JIS K 0081:2012 Method for determination of boron in flue gas
$58.00 JIS K 0086:1998 Methods for determination of phenols in flue gas
$49.00 JIS K 0088:1997 Methods for determination of benzene in flue gas
$39.00 JIS K 0089:1998 Methods for determination of acrolein in flue gas
$49.00 JIS K 0090:1998 Method for determination of phosgene in flue gas
$39.00 JIS K 0091:1998 Methods for determination of carbon disulfide in flue gas
$49.00 JIS K 0092:1998 Methods for determination of mercaptan in flue gas
$107.00 JIS K 0093:2006 Testing methods for polychlorobiphenyl in industrial water and wastewater
$107.00 JIS K 0095:1999 Methods for sampling of flue gas
$26.00 JIS K 0098:1998 Methods for determination of carbon monoxide in flue gas
$68.00 JIS K 0099:2004 Methods for determination of ammonia in flue gas
$107.00 JIS K 0103:2011 Methods for determination of sulfur oxides in flue gas
$107.00 JIS K 0104:2011 Methods for determination of nitrogen oxides in flue gas
$68.00 JIS K 0122:1997 General rules for ion selective electrode method
$107.00 JIS K 0133:2007 General rules for high frequency plasma mass spectrometry
$155.00 JIS K 0150:2009 Surface chemical analysis -- Analysis of zinc- and/or aluminium-based metallic coatings by glow-discharge optical-emission spectrometry
$49.00 JIS K 0222:1997 Methods for determination of mercury in stack gas
$68.00 JIS K 0225:2002 Testing methods for determination of trace components in diluent gas and zero gas
$97.00 JIS K 0301:2016 Methods for determination of oxygen in flue gas
$42.00 JIS K 0301:1998 Methods for determination of oxygen in flue gas
$39.00 JIS K 0305:1997 Methods for determination of trichloroethylene and tetrachloroethylene in flue gas
$136.00 JIS K 0311:2005 Method for determination of tetra-through octachlorodibenzo-p-dioxins, tetra-through octachlorodibenzofurans and dioxin-like polychlorinatedbiphenyls in stationary source emissions
$49.00 JIS K 0557:1998 Water used for industrial water and wastewater analysis
$87.00 JIS K 0804:2014 Gas detector tube measurement system (Length-of-stain type)
$39.00 JIS K 0806:1997 Automatic chemical oxygen demand meter
$58.00 JIS Z 8802:2011 Methods for determination of pH of aqueous solutions
$68.00 JIS K 0098:2016 Methods for determination of carbon monoxide in flue gas
$138.00 ISO 12963:2017 Gas analysis - Comparison methods for the determination of the composition of gas mixtures based on one- and two-point calibration
$45.00 ISO 15470:2017 Surface chemical analysis - X-ray photoelectron spectroscopy - Description of selected instrumental performance parameters
$103.00 ISO 16664:2017 Gas analysis - Handling of calibration gases and gas mixtures - Guidelines
$138.00 ISO 19668:2017 Surface chemical analysis - X-ray photoelectron spectroscopy - Estimating and reporting detection limits for elements in homogeneous materials
$162.00 ISO 6145-6:2017 Gas analysis - Preparation of calibration gas mixtures using dynamic methods - Part 6: Critical flow orifices